Periodic Si nanopillar arrays fabricated by colloidal lithography and catalytic etching for broadband and omnidirectional elimination of fresnel reflection

Hsin Ping Wang, Kun Yu Lai, Yi Ruei Lin, Chin An Lin, Jr-Hau He*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

103 Scopus citations


Periodic Si nanopillar arrays (NPAs) were fabricated by the colloidal lithography combined with catalytic etching. By varying the size of colloidal crystals using oxygen plasma etching, Si NPAs with desirable diameter and fill factor could be obtained. The Fresnel reflection can be eliminated effectively over broadband regions by NPAs; i.e., the wavelength-averaged specular reflectance is decreased to 0.70% at wavelengths of 200-1900 nm. The reflectance is reduced greatly for the incident angles up to 70° for both s- and p-polarized light. These excellent antireflection performances are attributed to light trapping effect and very low effective refractive indices, which can be modified by the fill factor of Si in the NPA layers.

Original languageEnglish (US)
Pages (from-to)12855-12858
Number of pages4
Issue number15
StatePublished - Aug 3 2010

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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