Abstract
A p-type phototransistor based on tin monoxide (SnO) thin film and a perovskite-mediated photogating effect to enhance the device performance are reported. Without the perovskite layer, the SnO thin film phototransistor exhibits a good figure of merit including on/off ratio (Ion/Ioff) over 103, hole mobility of 3.55 cm2 V−1 s−1, photoresponsivity of 1.83 × 103 A W−1, and detectivity of 2.11 × 1013 Jones at 655 nm; these values are among the highest reported for oxide-based devices. Furthermore, it is shown that when a hybrid perovskite MAPbI3 overlayer is deposited on the p-type SnO channel, the phototransistor behavior is significantly modified. Specifically, the field-effect mobility increases to 5.53 cm2 V−1 s−1 and the on/off ratio increases to 2.7 × 103 compared with an on/off ratio of 519 under dark. These effects can be ascribed to a perovskite-mediated photogating effect with favorable band alignment and interfacial charge transfer. This work not only introduces SnO as a new p-type phototransistor material but also presents a general approach to enhance the channel transport via coating a photoactive perovskite overlayer.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1800538 |
| Journal | Advanced Electronic Materials |
| Volume | 5 |
| Issue number | 1 |
| DOIs | |
| State | Published - Sep 27 2018 |
Bibliographical note
KAUST Repository Item: Exported on 2020-10-01Acknowledgements: X.G. and Z.W. contributed equally to this work. The research reported in this publication was supported by King Abdullah University of Science and Technology (KAUST).