Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty; Christine Ouyang; Marie Krysak; Markos Trikeriotis; Kyoungyoung Cho; Emmanuel P. Giannelis; Christopher K. Ober

doi:10.1117/12.2011490

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Souvik Chakrabarty, Christine Ouyang, Marie Krysak, Markos Trikeriotis, Kyoungyoung Cho, Emmanuel P. Giannelis, Christopher K. Ober

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

34 Scopus citations

Abstract

DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

Original language	English (US)
Title of host publication	Extreme Ultraviolet (EUV) Lithography IV
Publisher	SPIE-Intl Soc Optical Eng
ISBN (Print)	9780819494610
DOIs	https://doi.org/10.1117/12.2011490
State	Published - Apr 1 2013
Externally published	Yes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: The authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and theKAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.

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title = "Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning",

abstract = "DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. {\textcopyright} 2013 SPIE.",

author = "Souvik Chakrabarty and Christine Ouyang and Marie Krysak and Markos Trikeriotis and Kyoungyoung Cho and Giannelis, {Emmanuel P.} and Ober, {Christopher K.}",

note = "KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: The authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and theKAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities. This publication acknowledges KAUST support, but has no KAUST affiliated authors.",

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doi = "10.1117/12.2011490",

language = "English (US)",

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AU - Chakrabarty, Souvik

AU - Ouyang, Christine

AU - Krysak, Marie

AU - Trikeriotis, Markos

AU - Cho, Kyoungyoung

AU - Giannelis, Emmanuel P.

AU - Ober, Christopher K.

N1 - KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: The authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), Cornell Center of Materials Research (CCMR), the Nanobiotechnology Center (NBTC) and theKAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities. This publication acknowledges KAUST support, but has no KAUST affiliated authors.

PY - 2013/4/1

Y1 - 2013/4/1

N2 - DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

AB - DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresist materials. Spectroscopic results correlated with mass loss and dissolution studies suggest a ligand exchange mechanism responsible for altering the solubility between the exposed and unexposed regions. © 2013 SPIE.

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UR - http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.2011490

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U2 - 10.1117/12.2011490

DO - 10.1117/12.2011490

M3 - Conference contribution

SN - 9780819494610

BT - Extreme Ultraviolet (EUV) Lithography IV

PB - SPIE-Intl Soc Optical Eng

ER -

Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning

Abstract

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