Oxidative and carbonaceous patterning of Si surface in an organic media by scanning probe lithography

Matteo Lorenzoni*, Andrea Giugni, Bruno Torre

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations


A simple top-down fabrication technique that involves scanning probe lithography on Si is presented. The writing procedure consists of a chemically selective patterning in mesitylene. Operating in an organic media is possible to perform local oxidation or solvent decomposition during the same pass by tuning the applied bias. The layer deposited with a positively biased tip with sub-100-nm lateral resolution consists of nanocrystalline graphite, as verified by Raman spectroscopy. The oxide pattern obtained in opposite polarization is later used as a mask for dry etching, showing a remarkable selectivity in SF6plasma, to produce Si nanofeatured molds.

Original languageEnglish (US)
Article number75
Pages (from-to)1-9
Number of pages9
JournalNanoscale Research Letters
Issue number1
StatePublished - 2013

Bibliographical note

Funding Information:
This work was entirely supported by the Italian Institute of Technology (IIT). We specially appreciate the support coming from the facilities of the Nanostructures Department.


  • Dry etching mask
  • Nanocrystalline graphite
  • Scanning probe lithography

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics


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