One-step lateral growth for reduction in defect density of a-plane GaN on r-sapphire substrate and its application in light emitters

D. Iida, A. Miura, Y. Okadome, Y. Tsuchiya, T. Kawashima, T. Nagai, M. Iwaya, S. Kamiyama, H. Amano, I. Akasaki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

43 Scopus citations

Abstract

Low defect density a-plane GaN films were successfully grown by sidewall epitaxial lateral overgrowth (SELO) technology. Using this technology, a-plane GaN films with atomically flat surface were grown. The threading dislocation and stacking fault densities in the overgrown regions were lower than 10 6 cm -2 and 10 3 cm -1, respectively. We also fabricated and characterized a-plane-GaN-based LEDs using SELO technology. The light output power of a blue-green LED was shown to monotonically increase with decreasing of threading dislocation density. © 2007 WILEY-VCH Verlag GmbH & Co. KGaA.
Original languageEnglish (US)
Title of host publicationPhysica Status Solidi (A) Applications and Materials Science
Pages2005-2009
Number of pages5
DOIs
StatePublished - Jun 1 2007
Externally publishedYes

Bibliographical note

Generated from Scopus record by KAUST IRTS on 2023-09-21

ASJC Scopus subject areas

  • Materials Chemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces
  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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