On the structure-property inter-relationships of metal gate electrodes for future generation CMOS

Prashant Majhi*, Husam Niman Alshareef, Huang Chun Wen, Kisik Choi, Patrick Lysaght, Craig Huffman, Hongfa Luan, Rusty Harris, Byoung Hun Lee, Chuck Ramiller

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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