Novel photoresist design based on electrophilic aromatic substitution

B. Reck*, R. D. Allen, R. J. Twieg, C. G. Willson, S. Matuszczak, H. D.H. Stover, N. H. Li, Jean Frechet

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

4 Scopus citations

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Engineering & Materials Science