Rapid advances in the miniaturization of microelectronic devices require the development of new imageable polymeric materials for 193 nm microlithography. The design and synthesis of carbon-rich cyclopolymers incorporating both tert-butyl esters as imageable functionalities for chemical amplification and adamantane moieties for etch resistance. The cyclopolymerization route is advantageous as the final products that incorporate spiro linkages and hydrocarbon cages within the polymer backbone should exhibit good etch resistance while maintaining appropriate film forming properties.
|Original language||English (US)|
|Number of pages||5|
|State||Published - Jan 1 2000|
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering