New aqueous base-developable negative-tone photoresist based on furnas

James T. Fahey*, J. M.J. Frechet

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

7 Scopus citations


A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.

Original languageEnglish (US)
Pages (from-to)67-74
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1991
Externally publishedYes
EventProceedings of the Eighth Conference on Advances in Resist Technology and Processing VIII - San Jose, CA, USA
Duration: Mar 4 1991Mar 5 1991

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Applied Mathematics
  • Electrical and Electronic Engineering
  • Computer Science Applications


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