Abstract
A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.
Original language | English (US) |
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Pages (from-to) | 67-74 |
Number of pages | 8 |
Journal | Proceedings of SPIE - The International Society for Optical Engineering |
Volume | 1466 |
State | Published - 1991 |
Externally published | Yes |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics