New aqueous base-developable negative-tone photoresist based on furnas

James T. Fahey; J. M J Frechet

New aqueous base-developable negative-tone photoresist based on furnas

James T. Fahey^*, J. M J Frechet

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm²) and E-Beam (3.4μC/cm²) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.

Original language	English (US)
Pages (from-to)	67-74
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	1466
State	Published - 1991
Externally published	Yes

ASJC Scopus subject areas

Electrical and Electronic Engineering
Condensed Matter Physics

Cite this

@article{e253872fcda54bf5bc0d728522c112ee,

title = "New aqueous base-developable negative-tone photoresist based on furnas",

abstract = "A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.",

author = "Fahey, {James T.} and Frechet, {J. M J}",

year = "1991",

language = "English (US)",

volume = "1466",

pages = "67--74",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

}

TY - JOUR

T1 - New aqueous base-developable negative-tone photoresist based on furnas

AU - Fahey, James T.

AU - Frechet, J. M J

PY - 1991

Y1 - 1991

N2 - A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.

AB - A new versatile negative-tone resist consisting of poly [4-hydroxystyrene-co-4-(3-furyl-3-hydroxypropyl)styrene], and a photoacid generator is described. This chemically amplified resist which shows high sensitivity in the deep-UV (2.3mJ/cm2) and E-Beam (3.4μC/cm2) modes, operates on the basis of radiation induced crosslinking via acid-catalyzed electrophilic aromatic substitution. Due to the incorporation of phenolic substituents in the resist design aqueous development without swelling is possible.

UR - http://www.scopus.com/inward/record.url?scp=0025839197&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0025839197

SN - 0277-786X

VL - 1466

SP - 67

EP - 74

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

ER -

New aqueous base-developable negative-tone photoresist based on furnas

Abstract

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this