Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography

David C. Tully; Alexander R. Trimble; M. J. Frechet; Kathryn Wilder; Calvin F. Quate

Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography

David C. Tully^*, Alexander R. Trimble, M. J. Frechet, Kathryn Wilder, Calvin F. Quate

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

2 Scopus citations

Abstract

The monolayers of dendritic polymers can be prepared by covalent attachment to a silicon wafer surface. These ultra-thin polymer films can serve as effective resists for high resolution lithography using the scanning probe microscope. These dendrimer films may be patterned using the scanning probe lithography (SPL) to create features with dimensions below 60 nm. Although very thin, the dendrimer films are resistant to an aqueous HF etch, allowing the production of a positive tone image as the patterned oxide relief features are selectively removed.

Original language	English (US)
Pages (from-to)	402-403
Number of pages	2
Journal	American Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume	40
Issue number	1
State	Published - Mar 1999
Externally published	Yes
Event	Proceedings of the 1999 ACS Anaheim Meeting - Anaheim, CA, USA Duration: Mar 21 1999 → Mar 25 1999

ASJC Scopus subject areas

Polymers and Plastics

Cite this

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title = "Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography",

abstract = "The monolayers of dendritic polymers can be prepared by covalent attachment to a silicon wafer surface. These ultra-thin polymer films can serve as effective resists for high resolution lithography using the scanning probe microscope. These dendrimer films may be patterned using the scanning probe lithography (SPL) to create features with dimensions below 60 nm. Although very thin, the dendrimer films are resistant to an aqueous HF etch, allowing the production of a positive tone image as the patterned oxide relief features are selectively removed.",

author = "Tully, {David C.} and Trimble, {Alexander R.} and Frechet, {M. J.} and Kathryn Wilder and Quate, {Calvin F.}",

year = "1999",

month = mar,

language = "English (US)",

volume = "40",

pages = "402--403",

journal = "American Chemical Society, Polymer Preprints, Division of Polymer Chemistry",

issn = "0032-3934",

number = "1",

note = "Proceedings of the 1999 ACS Anaheim Meeting ; Conference date: 21-03-1999 Through 25-03-1999",

}

TY - JOUR

T1 - Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography

AU - Tully, David C.

AU - Trimble, Alexander R.

AU - Frechet, M. J.

AU - Wilder, Kathryn

AU - Quate, Calvin F.

PY - 1999/3

Y1 - 1999/3

N2 - The monolayers of dendritic polymers can be prepared by covalent attachment to a silicon wafer surface. These ultra-thin polymer films can serve as effective resists for high resolution lithography using the scanning probe microscope. These dendrimer films may be patterned using the scanning probe lithography (SPL) to create features with dimensions below 60 nm. Although very thin, the dendrimer films are resistant to an aqueous HF etch, allowing the production of a positive tone image as the patterned oxide relief features are selectively removed.

AB - The monolayers of dendritic polymers can be prepared by covalent attachment to a silicon wafer surface. These ultra-thin polymer films can serve as effective resists for high resolution lithography using the scanning probe microscope. These dendrimer films may be patterned using the scanning probe lithography (SPL) to create features with dimensions below 60 nm. Although very thin, the dendrimer films are resistant to an aqueous HF etch, allowing the production of a positive tone image as the patterned oxide relief features are selectively removed.

UR - http://www.scopus.com/inward/record.url?scp=0033095339&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0033095339

SN - 0032-3934

VL - 40

SP - 402

EP - 403

JO - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

JF - American Chemical Society, Polymer Preprints, Division of Polymer Chemistry

IS - 1

T2 - Proceedings of the 1999 ACS Anaheim Meeting

Y2 - 21 March 1999 through 25 March 1999

ER -

Nanoscale patterning of self-assembled dendrimer monolayers using scanning probe lithography

Abstract

ASJC Scopus subject areas

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