Nanometer biodevice fabrication by electron beam lithography

Enzo Di Fabrizio*, Luca Grella, Marco Baciocchi, Massimo Gentili, Cesare Ascoli, Brunero Cappella, Carlo Frediani, Piero Morales

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

23 Scopus citations


A conventional electron beam lithography machine operated at 50 kV is used in this work to fabricate devices and structures for biophysical and molecular electronics applications featuring critical dimensions down to the nanometer region. Such nanostructures are used for deposition and manipulation of organic molecules; fabricated devices include fine pitch self-standing meshes for laser deposition of molecules, a bimetallic miniaturized glucose sensor and nanogaps for molecular trapping and probing. The developed process is described in detail and by means of Monte Carlo simulation, the various electron scattering processes are modelled. Critical issues, such as fabrication of nanogaps with dimension down to 5 nm, are also addressed.

Original languageEnglish (US)
Pages (from-to)2892-2896
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
StatePublished - Nov 1 1997

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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