Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide

S. Larouche; A. Amassian; S. C. Gujrathi; J. E. Klemberg-Sapieha; L. Martinu

Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide

S. Larouche^*, A. Amassian, S. C. Gujrathi, J. E. Klemberg-Sapieha, L. Martinu

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

In the present work, we fabricated model optical filters with multilayer and graded index (inhomogeneous) designs using TiO₂, SiO₂, and TiO₂/SiO₂ mixtures. The deposition process was monitored by in situ spectroscopic ellipsometry and reflectometry. The filters were further characterized by ex situ variable angle spectroscopic ellipsometry and spectrophotometry, and their compositional depth profiles were determined by elastic recoil detection in time-of-flight regime. This multitechnique approach allowed us to evaluate the effect of microstructural features on the optical performance.

Original language	English (US)
Pages (from-to)	277-281
Number of pages	5
Journal	Proceedings, Annual Technical Conference - Society of Vacuum Coaters
State	Published - 2001
Externally published	Yes

Keywords

Optical filters
Plasma-enhanced chemical vapor deposition (PECVD)
Silicon dioxide (SiO)
Titanium dioxide (TiO)

ASJC Scopus subject areas

Mechanical Engineering
Surfaces and Interfaces
Surfaces, Coatings and Films
Fluid Flow and Transfer Processes

Cite this

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title = "Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide",

abstract = "In the present work, we fabricated model optical filters with multilayer and graded index (inhomogeneous) designs using TiO2, SiO2, and TiO2/SiO2 mixtures. The deposition process was monitored by in situ spectroscopic ellipsometry and reflectometry. The filters were further characterized by ex situ variable angle spectroscopic ellipsometry and spectrophotometry, and their compositional depth profiles were determined by elastic recoil detection in time-of-flight regime. This multitechnique approach allowed us to evaluate the effect of microstructural features on the optical performance.",

keywords = "Optical filters, Plasma-enhanced chemical vapor deposition (PECVD), Silicon dioxide (SiO), Titanium dioxide (TiO)",

author = "S. Larouche and A. Amassian and Gujrathi, {S. C.} and Klemberg-Sapieha, {J. E.} and L. Martinu",

year = "2001",

language = "English (US)",

pages = "277--281",

journal = "Proceedings, Annual Technical Conference - Society of Vacuum Coaters",

issn = "0737-5921",

publisher = "Society of Vacuum Coaters",

}

TY - JOUR

T1 - Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide

AU - Larouche, S.

AU - Amassian, A.

AU - Gujrathi, S. C.

AU - Klemberg-Sapieha, J. E.

AU - Martinu, L.

PY - 2001

Y1 - 2001

N2 - In the present work, we fabricated model optical filters with multilayer and graded index (inhomogeneous) designs using TiO2, SiO2, and TiO2/SiO2 mixtures. The deposition process was monitored by in situ spectroscopic ellipsometry and reflectometry. The filters were further characterized by ex situ variable angle spectroscopic ellipsometry and spectrophotometry, and their compositional depth profiles were determined by elastic recoil detection in time-of-flight regime. This multitechnique approach allowed us to evaluate the effect of microstructural features on the optical performance.

AB - In the present work, we fabricated model optical filters with multilayer and graded index (inhomogeneous) designs using TiO2, SiO2, and TiO2/SiO2 mixtures. The deposition process was monitored by in situ spectroscopic ellipsometry and reflectometry. The filters were further characterized by ex situ variable angle spectroscopic ellipsometry and spectrophotometry, and their compositional depth profiles were determined by elastic recoil detection in time-of-flight regime. This multitechnique approach allowed us to evaluate the effect of microstructural features on the optical performance.

KW - Optical filters

KW - Plasma-enhanced chemical vapor deposition (PECVD)

KW - Silicon dioxide (SiO)

KW - Titanium dioxide (TiO)

UR - http://www.scopus.com/inward/record.url?scp=0035212765&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0035212765

SN - 0737-5921

SP - 277

EP - 281

JO - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

JF - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

ER -

Multilayer and inhomogeneous optical filters fabricated by PECVD using titanium dioxide and silicon dioxide

Abstract

Keywords

ASJC Scopus subject areas

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