MOS memory with double-layer high-κ tunnel oxide Al2O3/HfO2 and ZnO charge trapping layer

Nazek El-Atab, Ammar Nayfeh, Berk Berkan Turgut, Ali K. Okyay

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

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Material Science

Engineering