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Morphological evaluation of epitaxial GaN grown on r-plane sapphire by metalorganic vapor-phase epitaxy
K. Kusakabe
*
,
K. Ohkawa
*
Corresponding author for this work
Research output
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Contribution to journal
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Conference article
›
peer-review
1
Scopus citations
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Dive into the research topics of 'Morphological evaluation of epitaxial GaN grown on r-plane sapphire by metalorganic vapor-phase epitaxy'. Together they form a unique fingerprint.
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Keyphrases
Crystal Orientation
50%
Epitaxial
50%
Epitaxial GaN
100%
GaN Buffer
50%
GaN Films
100%
Growth Temperature
50%
Low Temperature
50%
Metal Organic Vapor Phase Epitaxy (MOVPE)
100%
Morphological Evaluation
100%
Peak-to-valley
50%
R-plane Sapphire
100%
Rough Morphology
50%
Sapphire Substrate
50%
Surface Roughness
50%
Material Science
Morphology
100%
Sapphire
100%
Surface Roughness
50%
Vapor Phase Epitaxy
100%