Modifying the Nanostructure of Co[Sio2] Samples by Controlled Annealing

J. C. Denardin; M. Knobel; L. M. Socolovsky; A. L. Brandl; X. X. Zhang

doi:10.1109/TMAG.2003.815593

Modifying the Nanostructure of Co[Sio₂] Samples by Controlled Annealing

J. C. Denardin^*, M. Knobel, L. M. Socolovsky, A. L. Brandl, X. X. Zhang

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

In situ measurements of resistance were made on cosputtered Co _0.35[SiO₂]_0.65 granular films during annealing. The aim is to control the thermal treatment parameters and map the microstructural changes of the samples, with the respective magnetotransport response. Results of transmission electron microscopy, dc magnetization, and temperature dependence of resistivity, after annealing, show a clear evolution in the nanostructure of the samples, with increasing average Co grain sizes and wider dispersion.

Original language	English (US)
Pages (from-to)	2767-2769
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	39
Issue number	5 II
DOIs	https://doi.org/10.1109/TMAG.2003.815593
State	Published - Sep 2003
Externally published	Yes

Keywords

Heat treatment
Magnetic films
Magnetoresistance

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

Access to Document

10.1109/TMAG.2003.815593

Cite this

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title = "Modifying the Nanostructure of Co[Sio2] Samples by Controlled Annealing",

abstract = "In situ measurements of resistance were made on cosputtered Co 0.35[SiO2]0.65 granular films during annealing. The aim is to control the thermal treatment parameters and map the microstructural changes of the samples, with the respective magnetotransport response. Results of transmission electron microscopy, dc magnetization, and temperature dependence of resistivity, after annealing, show a clear evolution in the nanostructure of the samples, with increasing average Co grain sizes and wider dispersion.",

keywords = "Heat treatment, Magnetic films, Magnetoresistance",

author = "Denardin, {J. C.} and M. Knobel and Socolovsky, {L. M.} and Brandl, {A. L.} and Zhang, {X. X.}",

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AU - Zhang, X. X.

PY - 2003/9

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AB - In situ measurements of resistance were made on cosputtered Co 0.35[SiO2]0.65 granular films during annealing. The aim is to control the thermal treatment parameters and map the microstructural changes of the samples, with the respective magnetotransport response. Results of transmission electron microscopy, dc magnetization, and temperature dependence of resistivity, after annealing, show a clear evolution in the nanostructure of the samples, with increasing average Co grain sizes and wider dispersion.

KW - Heat treatment

KW - Magnetic films

KW - Magnetoresistance

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