Modifying the nanostructure of Co[SiO2] samples by controlled annealing

J. C. Denardin; M. Knobel; L. M. Socolovsky; A. L. Brandl; X. X. Zhang

doi:10.1109/INTMAG.2003.1230705

Modifying the nanostructure of Co[SiO₂] samples by controlled annealing

J. C. Denardin, M. Knobel, L. M. Socolovsky, A. L. Brandl, X. X. Zhang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

In this article, on-line measurements of resistance were made on co-sputtered Co[SiO₂]_0.65 granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.

Original language	English (US)
Title of host publication	Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	0780376471, 9780780376472
DOIs	https://doi.org/10.1109/INTMAG.2003.1230705
State	Published - 2003
Externally published	Yes
Event	2003 IEEE International Magnetics Conference, Intermag 2003 - Boston, United States Duration: Mar 30 2003 → Apr 3 2003

Publication series

Name	Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference

Other

Other	2003 IEEE International Magnetics Conference, Intermag 2003
Country/Territory	United States
City	Boston
Period	03/30/03 → 04/3/03

Bibliographical note

Publisher Copyright:
© 2003 IEEE.

Keywords

Annealing
Conductivity
Cooling
Curve fitting
Tin

ASJC Scopus subject areas

General Engineering

Access to Document

10.1109/INTMAG.2003.1230705

Cite this

Denardin, J. C., Knobel, M., Socolovsky, L. M., Brandl, A. L., & Zhang, X. X. (2003). Modifying the nanostructure of Co[SiO₂] samples by controlled annealing. In Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference Article 1230705 (Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2003.1230705

@inproceedings{e9fb8ed6ec424996ac036dca3511a8fe,

title = "Modifying the nanostructure of Co[SiO2] samples by controlled annealing",

abstract = "In this article, on-line measurements of resistance were made on co-sputtered Co[SiO2]0.65 granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.",

keywords = "Annealing, Conductivity, Cooling, Curve fitting, Tin",

author = "Denardin, {J. C.} and M. Knobel and Socolovsky, {L. M.} and Brandl, {A. L.} and Zhang, {X. X.}",

note = "Publisher Copyright: {\textcopyright} 2003 IEEE.; 2003 IEEE International Magnetics Conference, Intermag 2003 ; Conference date: 30-03-2003 Through 03-04-2003",

year = "2003",

doi = "10.1109/INTMAG.2003.1230705",

language = "English (US)",

series = "Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

booktitle = "Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference",

address = "United States",

}

Denardin, JC, Knobel, M, Socolovsky, LM, Brandl, AL & Zhang, XX 2003, Modifying the nanostructure of Co[SiO₂] samples by controlled annealing. in Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference., 1230705, Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference, Institute of Electrical and Electronics Engineers Inc., 2003 IEEE International Magnetics Conference, Intermag 2003, Boston, United States, 03/30/03. https://doi.org/10.1109/INTMAG.2003.1230705

Modifying the nanostructure of Co[SiO₂] samples by controlled annealing. / Denardin, J. C.; Knobel, M.; Socolovsky, L. M. et al.
Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc., 2003. 1230705 (Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Modifying the nanostructure of Co[SiO2] samples by controlled annealing

AU - Denardin, J. C.

AU - Knobel, M.

AU - Socolovsky, L. M.

AU - Brandl, A. L.

AU - Zhang, X. X.

PY - 2003

Y1 - 2003

N2 - In this article, on-line measurements of resistance were made on co-sputtered Co[SiO2]0.65 granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.

AB - In this article, on-line measurements of resistance were made on co-sputtered Co[SiO2]0.65 granular films during annealing. The aim was to control the thermal treatment parameters and map the microstructural changes in the sample, and the respective magnetotransport response.

KW - Annealing

KW - Conductivity

KW - Cooling

KW - Curve fitting

KW - Tin

UR - http://www.scopus.com/inward/record.url?scp=84949503359&partnerID=8YFLogxK

U2 - 10.1109/INTMAG.2003.1230705

DO - 10.1109/INTMAG.2003.1230705

M3 - Conference contribution

AN - SCOPUS:84949503359

T3 - Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference

BT - Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2003 IEEE International Magnetics Conference, Intermag 2003

Y2 - 30 March 2003 through 3 April 2003

ER -

Denardin JC, Knobel M, Socolovsky LM, Brandl AL, Zhang XX. Modifying the nanostructure of Co[SiO₂] samples by controlled annealing. In Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc. 2003. 1230705. (Intermag 2003 - Program of the 2003 IEEE International Magnetics Conference). doi: 10.1109/INTMAG.2003.1230705