Abstract
In the present work, we study the microstructural properties of SiO 2/TiO2 mixtures deposited by plasma-enhanced chemical vapor deposition using Fourier transform infrared spectroscopy, X-ray photoelectron spectroscopy and X-ray diffraction. We found that the chemical and physical properties of the mixtures are consistent with a single-phase material. These materials, with an adjustable refractive index, are then applied for the fabrication of rugate filters. For monitoring their deposition, we propose a new technique that analyzes the ellipsometric spectra outside of the rejection band in order to determine, in real-time, the optical thickness of the growing filter. An example is shown for a single-band rugate filter centered at 550 nm.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 334-338 |
| Number of pages | 5 |
| Journal | Proceedings, Annual Technical Conference - Society of Vacuum Coaters |
| State | Published - 2003 |
| Externally published | Yes |
| Event | 46th Annual Technical Conference Proceedings - San Francisco, CA, United States Duration: May 3 2003 → May 8 2003 |
Keywords
- Graded-index optical filters
- Plasma-enhanced chemical vapor deposition (PECVD)
- Real-time in-situ monitoring
- Silica/titania mixtures
ASJC Scopus subject areas
- Mechanical Engineering
- Surfaces and Interfaces
- Fluid Flow and Transfer Processes
- Surfaces, Coatings and Films