Microlithographic assessment of a novel family of transparent and etch-resistant chemically amplified 193-nm resists based on cyclopolymers

J. M. Klopp, D. Pasini, J. D. Byers, C. Grant Willson, Jean Frechet*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

40 Scopus citations

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