Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia A. Krasnoperova; Zheng Guo Chen; Franco Cerrina; E. Difabrizio; Massimo Gentili; Wenbing Yun; Barry P. Lai; Efim S. Gluskin

Microfocusing optics for hard xrays fabricated by x-ray lithography

Azalia A. Krasnoperova^*, Zheng Guo Chen, Franco Cerrina, E. Difabrizio, Massimo Gentili, Wenbing Yun, Barry P. Lai, Efim S. Gluskin

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

4 Scopus citations

Abstract

Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.

Original language	English (US)
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Pages	15-26
Number of pages	12
Volume	2516
State	Published - 1995
Externally published	Yes
Event	X-Ray Microbeam Technology and Applications - San Diego, CA, USA Duration: Jul 11 1995 → Jul 12 1995

Other

Other	X-Ray Microbeam Technology and Applications
City	San Diego, CA, USA
Period	07/11/95 → 07/12/95

ASJC Scopus subject areas

Electrical and Electronic Engineering
Condensed Matter Physics

Cite this

@inproceedings{98a645e860bd4ca58a8e90e8f6795e84,

title = "Microfocusing optics for hard xrays fabricated by x-ray lithography",

abstract = "Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.",

author = "Krasnoperova, {Azalia A.} and Chen, {Zheng Guo} and Franco Cerrina and E. Difabrizio and Massimo Gentili and Wenbing Yun and Lai, {Barry P.} and Gluskin, {Efim S.}",

year = "1995",

language = "English (US)",

isbn = "0819418757",

volume = "2516",

pages = "15--26",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "X-Ray Microbeam Technology and Applications ; Conference date: 11-07-1995 Through 12-07-1995",

}

TY - GEN

T1 - Microfocusing optics for hard xrays fabricated by x-ray lithography

AU - Krasnoperova, Azalia A.

AU - Chen, Zheng Guo

AU - Cerrina, Franco

AU - Difabrizio, E.

AU - Gentili, Massimo

AU - Yun, Wenbing

AU - Lai, Barry P.

AU - Gluskin, Efim S.

PY - 1995

Y1 - 1995

N2 - Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.

AB - Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.

UR - http://www.scopus.com/inward/record.url?scp=0029518068&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0029518068

SN - 0819418757

SN - 9780819418753

VL - 2516

SP - 15

EP - 26

BT - Proceedings of SPIE - The International Society for Optical Engineering

T2 - X-Ray Microbeam Technology and Applications

Y2 - 11 July 1995 through 12 July 1995

ER -

Microfocusing optics for hard xrays fabricated by x-ray lithography

Abstract

Other

ASJC Scopus subject areas

Other files and links

Fingerprint

Cite this