Abstract
Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.
Original language | English (US) |
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Title of host publication | Proceedings of SPIE - The International Society for Optical Engineering |
Pages | 15-26 |
Number of pages | 12 |
Volume | 2516 |
State | Published - 1995 |
Externally published | Yes |
Event | X-Ray Microbeam Technology and Applications - San Diego, CA, USA Duration: Jul 11 1995 → Jul 12 1995 |
Other
Other | X-Ray Microbeam Technology and Applications |
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City | San Diego, CA, USA |
Period | 07/11/95 → 07/12/95 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics