Metal gate work function engineering using AlN x interfacial layers

H. N. Alshareef*, H. F. Luan, K. Choi, H. R. Harris, H. C. Wen, M. A. Quevedo-Lopez, P. Majhi, B. H. Lee

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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Chemical Engineering