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Low Temperature Scalable Deposition of Copper (I) Thiocyanate Films via Aerosol-Assisted Chemical Vapour Deposition
Lokeshwari Mohan, Sinclair R. Ratnasingham, Julianna Panidi, Thomas D. Anthopoulos, Russell Binions, Martyn A. McLachlan, Joe Briscoe
Research output: Contribution to journal › Article › peer-review
6
Scopus
citations