Low damage and low surface roughness GaInP etching in Cl2/Ar electron cyclotron resonance process

S. F. Yoon*, Tien Khee Ng, H. Q. Zheng

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Fingerprint

Dive into the research topics of 'Low damage and low surface roughness GaInP etching in Cl2/Ar electron cyclotron resonance process'. Together they form a unique fingerprint.

Chemistry

Engineering

Physics

Material Science

Pharmacology, Toxicology and Pharmaceutical Science