Low cost transparent SU-8 membrane mask for deep X-ray lithography

S. Cabrini; F. Pérennès; B. Marmiroli; A. Olivo; A. Carpentiero; R. Kumar; P. Candeloro; E. Di Fabrizio

doi:10.1007/s00542-004-0473-5

Low cost transparent SU-8 membrane mask for deep X-ray lithography

S. Cabrini^*, F. Pérennès, B. Marmiroli, A. Olivo, A. Carpentiero, R. Kumar, P. Candeloro, E. Di Fabrizio

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm) ² and compatibility with the standard fabrication processes (optical lithography and gold electroforming). Moreover higher resolution can be achieved with low roughness flat membrane. Furthermore multiple aligned exposures require an optically transparent material. Diamond like Carbon membranes fulfill those requirements but have a prohibitive cost. Our approach consists in using an SU-8 epoxy resin layer as membrane material. In this communication the different steps of the fabrication process will be presented, as well as the results obtained using the mask for particular applications.

Original language	English (US)
Pages (from-to)	370-373
Number of pages	4
Journal	Microsystem Technologies
Volume	11
Issue number	4-5
DOIs	https://doi.org/10.1007/s00542-004-0473-5
State	Published - Apr 2005
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Hardware and Architecture
Electrical and Electronic Engineering

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10.1007/s00542-004-0473-5

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title = "Low cost transparent SU-8 membrane mask for deep X-ray lithography",

abstract = "Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm) 2 and compatibility with the standard fabrication processes (optical lithography and gold electroforming). Moreover higher resolution can be achieved with low roughness flat membrane. Furthermore multiple aligned exposures require an optically transparent material. Diamond like Carbon membranes fulfill those requirements but have a prohibitive cost. Our approach consists in using an SU-8 epoxy resin layer as membrane material. In this communication the different steps of the fabrication process will be presented, as well as the results obtained using the mask for particular applications.",

author = "S. Cabrini and F. P{\'e}renn{\`e}s and B. Marmiroli and A. Olivo and A. Carpentiero and R. Kumar and P. Candeloro and Fabrizio, {E. Di}",

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AU - Cabrini, S.

AU - Pérennès, F.

AU - Marmiroli, B.

AU - Olivo, A.

AU - Carpentiero, A.

AU - Kumar, R.

AU - Candeloro, P.

AU - Fabrizio, E. Di

PY - 2005/4

Y1 - 2005/4

N2 - Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm) 2 and compatibility with the standard fabrication processes (optical lithography and gold electroforming). Moreover higher resolution can be achieved with low roughness flat membrane. Furthermore multiple aligned exposures require an optically transparent material. Diamond like Carbon membranes fulfill those requirements but have a prohibitive cost. Our approach consists in using an SU-8 epoxy resin layer as membrane material. In this communication the different steps of the fabrication process will be presented, as well as the results obtained using the mask for particular applications.

AB - Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm) 2 and compatibility with the standard fabrication processes (optical lithography and gold electroforming). Moreover higher resolution can be achieved with low roughness flat membrane. Furthermore multiple aligned exposures require an optically transparent material. Diamond like Carbon membranes fulfill those requirements but have a prohibitive cost. Our approach consists in using an SU-8 epoxy resin layer as membrane material. In this communication the different steps of the fabrication process will be presented, as well as the results obtained using the mask for particular applications.

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JO - Microsystem Technologies

JF - Microsystem Technologies

IS - 4-5

ER -

Low cost transparent SU-8 membrane mask for deep X-ray lithography

Abstract

ASJC Scopus subject areas

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