Low cost transparent SU-8 membrane mask for deep X-ray lithography

S. Cabrini*, F. Pérennès, B. Marmiroli, A. Olivo, A. Carpentiero, R. Kumar, P. Candeloro, E. Di Fabrizio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Scopus citations


Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm) 2 and compatibility with the standard fabrication processes (optical lithography and gold electroforming). Moreover higher resolution can be achieved with low roughness flat membrane. Furthermore multiple aligned exposures require an optically transparent material. Diamond like Carbon membranes fulfill those requirements but have a prohibitive cost. Our approach consists in using an SU-8 epoxy resin layer as membrane material. In this communication the different steps of the fabrication process will be presented, as well as the results obtained using the mask for particular applications.

Original languageEnglish (US)
Pages (from-to)370-373
Number of pages4
JournalMicrosystem Technologies
Issue number4-5
StatePublished - Apr 2005
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Hardware and Architecture
  • Electrical and Electronic Engineering


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