Abstract
High performance flexible electronics promise innovative future technology for various interactive applications for the pursuit of low-cost, light-weight, and multi-functional devices. Thus, here we show a complementary metal oxide semiconductor (CMOS) compatible fabrication of flexible metal-oxide-semiconductor capacitors (MOSCAPs) with high-κ/metal gate stack, using a physical vapor deposition (PVD) cost-effective technique to obtain a high-quality Ge channel. We report outstanding bending radius ~1.25 mm and semi-transparency of 30%.
Original language | English (US) |
---|---|
Pages (from-to) | 794-800 |
Number of pages | 7 |
Journal | physica status solidi (RRL) - Rapid Research Letters |
Volume | 08 |
Issue number | 09 |
DOIs | |
State | Published - Jun 16 2014 |
Bibliographical note
KAUST Repository Item: Exported on 2020-10-01Acknowledged KAUST grant number(s): CRG-1-2012-HUS-008
Acknowledgements: We thank KAUST OCRF Competitive Research Grant (CRG) 1 CRG-1-2012-HUS-008 for supporting this research.
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics