Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

Daeho Lee; Heng Pan; Alex Sherry; Seung Hwan Ko; Ming-Tsang Lee; Eunpa Kim; Costas P Grigoropoulos

doi:10.1088/0957-4484/23/34/344012

Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

Daeho Lee, Heng Pan, Alex Sherry, Seung Hwan Ko, Ming-Tsang Lee, Eunpa Kim, Costas P Grigoropoulos

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.

Original language	English (US)
Pages (from-to)	344012
Journal	Nanotechnology
Volume	23
Issue number	34
DOIs	https://doi.org/10.1088/0957-4484/23/34/344012
State	Published - Aug 10 2012
Externally published	Yes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: Support by the National Science Foundation under Grant CMMI 0820605 and by the King Abdullah University of Science and Technology (KAUST) is gratefully acknowledged.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.

Access to Document

10.1088/0957-4484/23/34/344012

Cite this

@article{350c6af318ed416eab3fa9044e155198,

title = "Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing",

abstract = "Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. {\textcopyright} 2012 IOP Publishing Ltd.",

author = "Daeho Lee and Heng Pan and Alex Sherry and Ko, {Seung Hwan} and Ming-Tsang Lee and Eunpa Kim and Grigoropoulos, {Costas P}",

note = "KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: Support by the National Science Foundation under Grant CMMI 0820605 and by the King Abdullah University of Science and Technology (KAUST) is gratefully acknowledged. This publication acknowledges KAUST support, but has no KAUST affiliated authors.",

year = "2012",

month = aug,

day = "10",

doi = "10.1088/0957-4484/23/34/344012",

language = "English (US)",

volume = "23",

pages = "344012",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing Ltd.",

number = "34",

}

TY - JOUR

T1 - Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

AU - Lee, Daeho

AU - Pan, Heng

AU - Sherry, Alex

AU - Ko, Seung Hwan

AU - Lee, Ming-Tsang

AU - Kim, Eunpa

AU - Grigoropoulos, Costas P

N1 - KAUST Repository Item: Exported on 2020-10-01 Acknowledgements: Support by the National Science Foundation under Grant CMMI 0820605 and by the King Abdullah University of Science and Technology (KAUST) is gratefully acknowledged. This publication acknowledges KAUST support, but has no KAUST affiliated authors.

PY - 2012/8/10

Y1 - 2012/8/10

N2 - Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.

AB - Laser-assisted, one-step direct nanoimprinting of metal and semiconductor nanoparticles (NPs) was investigated to fabricate submicron structures including mesh, line, nanopillar and nanowire arrays. Master molds were fabricated with high-speed (200mms 1) laser direct writing (LDW) of negative or positive photoresists on Si wafers. The fabrication was completely free of lift-off or reactive ion etching processes. Polydimethylsiloxane (PDMS) stamps fabricated from master molds replicated nanoscale structures (down to 200nm) with no or negligible residual layers on various substrates. The low temperature and pressure used for nanoimprinting enabled direct nanofabrication on flexible substrates. With the aid of high-speed LDW, wafer scale 4inch direct nanoimprinting was demonstrated. © 2012 IOP Publishing Ltd.

UR - http://hdl.handle.net/10754/598699

UR - https://iopscience.iop.org/article/10.1088/0957-4484/23/34/344012

UR - http://www.scopus.com/inward/record.url?scp=84865000315&partnerID=8YFLogxK

U2 - 10.1088/0957-4484/23/34/344012

DO - 10.1088/0957-4484/23/34/344012

M3 - Article

C2 - 22885478

SN - 0957-4484

VL - 23

SP - 344012

JO - Nanotechnology

JF - Nanotechnology

IS - 34

ER -

Large-area nanoimprinting on various substrates by reconfigurable maskless laser direct writing

Abstract

Bibliographical note

Access to Document

Other files and links

Fingerprint

Cite this