Large-area few-layer MoS 2 deposited by sputtering

Material Science

• Annealing 100%
• Magnetron Sputtering 100%
• Grain Size 50%
• Field Effect Transistors 50%
• Photoluminescence 50%
• Layered Material 50%
• Transition Metal Dichalcogenides 50%
• Electron Microscopy 50%
• Film 50%
• Density 50%
• Transmission Electron Microscopy 50%
• Grain Boundary 50%

Engineering

• MoS2 100%
• Magnetron 66%
• Field-Effect Transistor 33%
• Two Dimensional 33%
• Film Quality 33%
• Transmissions 33%
• Controllability 33%
• Transition Metal Dichalcogenide 33%
• Crystallinity 33%
• Grain Boundary 33%
• Charge Density 33%

Keyphrases

• Trapped Charge Density 50%
• Sputtering Temperature 50%
• Annealing Ambience 50%