Isopropanol/water as a developer for poly(dimethylglutarimide)

Robert W. Johnstone; Ian G. Foulds; Manu V. Pallapa; Ash M. Parameswaran

doi:10.1117/1.2990738

Isopropanol/water as a developer for poly(dimethylglutarimide)

Robert W. Johnstone^*, Ian G. Foulds, Manu V. Pallapa, Ash M. Parameswaran

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.

Original language	English (US)
Article number	043006
Journal	Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume	7
Issue number	4
DOIs	https://doi.org/10.1117/1.2990738
State	Published - 2008
Externally published	Yes

Keywords

Deep UV
Developer
Dissolution
Isopropanol
Photoresist
Poly(dimethylglutarimide)

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

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10.1117/1.2990738

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title = "Isopropanol/water as a developer for poly(dimethylglutarimide)",

abstract = "Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.",

keywords = "Deep UV, Developer, Dissolution, Isopropanol, Photoresist, Poly(dimethylglutarimide)",

author = "Johnstone, {Robert W.} and Foulds, {Ian G.} and Pallapa, {Manu V.} and Parameswaran, {Ash M.}",

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language = "English (US)",

volume = "7",

journal = "Journal of Micro/Nanolithography, MEMS, and MOEMS",

issn = "1932-5150",

publisher = "Society of Photo-optical Instrumentation Engineers",

number = "4",

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TY - JOUR

T1 - Isopropanol/water as a developer for poly(dimethylglutarimide)

AU - Johnstone, Robert W.

AU - Foulds, Ian G.

AU - Pallapa, Manu V.

AU - Parameswaran, Ash M.

PY - 2008

Y1 - 2008

N2 - Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.

AB - Poly(dimethylglutarimide) (PMGI) is a resist that is commonly used in bilayer and trilayer imaging applications. PMGI can be exposed using various radiation sources including deep UV. Currently, there are only two developers for PMGI reported in the literature: tetramethylammonium hydroxide and tetraethylammonium hydroxide. We introduce a new developer for PMGI, a mixture of isopropanol (IPA) and water. Samples were irradiated with deep UV at 254 nm. The IPA/water developer exhibits rapid dissolution of exposed PMGI, of many microns per minute. However, PMGI exhibits high absorption at 254 nm, so the development depth is limited. The depth limit, after a critical dose, increases linearly with the exposure dose.

KW - Deep UV

KW - Developer

KW - Dissolution

KW - Isopropanol

KW - Photoresist

KW - Poly(dimethylglutarimide)

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U2 - 10.1117/1.2990738

DO - 10.1117/1.2990738

M3 - Article

AN - SCOPUS:79953027873

SN - 1932-5150

VL - 7

JO - Journal of Micro/Nanolithography, MEMS, and MOEMS

JF - Journal of Micro/Nanolithography, MEMS, and MOEMS

IS - 4

M1 - 043006

ER -

Isopropanol/water as a developer for poly(dimethylglutarimide)

Abstract

Keywords

ASJC Scopus subject areas

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