(Invited) Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells

Nicolas Tétreault; L-P. Heiniger; M Stefik; P. L. Labouchère; Éric Arsenault; N. K. Nazeeruddin; G A. Ozin; M. Grätzel

doi:10.1149/1.3633681

(Invited) Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells

Nicolas Tétreault, L-P. Heiniger, M Stefik, P. L. Labouchère, Éric Arsenault, N. K. Nazeeruddin, G A. Ozin, M. Grätzel

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

19 Scopus citations

Abstract

Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al 2O 3, ZnO, SnO 2, Nb 2O 5, HfO 2, Ga 2O 3 and TiO 2 for research on dye-sensitized solar cell. In particular, we review the fabrication of state-of-the-art 3D host-passivation-guest photoanodes and ZnO nanowires as well as characterize the deposited thin films using spectroscopic ellipsometry, X-ray diffraction, Hall effect, J-V curves and electrochemical impedance spectroscopy. ©The Electrochemical Society.

Original language	English (US)
Title of host publication	ECS Transactions
Publisher	The Electrochemical Society
Pages	303-314
Number of pages	12
ISBN (Print)	9781566779029
DOIs	https://doi.org/10.1149/1.3633681
State	Published - 2011
Externally published	Yes

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledged KAUST grant number(s): KUS-C1-015-21
Acknowledgements: N. T. work was supported by the King Abdullah University of Science and Technology (KAUST, Award No KUS-C1-015-21). L-P. H. is supported by the Swiss National Science Foundation (Grant Nr. 200020_125163). P. L. and M.K.N work is funded by EU FP7 project “ORION” grant agreement number NMP-229036. G. A. O. is deeply indebted to the Government of Canada for a Research Chair in Materials Chemistry and Nanochemistry enabling this research at UofT. In addition he thanks the Natural Sciences and Engineering Research Council (NSERC) of Canada and the NSERC Solar Network for strong and sustained financial support of this work. E. A. thanks NSERC for a graduate scholarship.
This publication acknowledges KAUST support, but has no KAUST affiliated authors.

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@inproceedings{ee4649fd9e0e4cd38b9e88f8bde7bac3,

title = "(Invited) Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells",

abstract = "Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al 2O 3, ZnO, SnO 2, Nb 2O 5, HfO 2, Ga 2O 3 and TiO 2 for research on dye-sensitized solar cell. In particular, we review the fabrication of state-of-the-art 3D host-passivation-guest photoanodes and ZnO nanowires as well as characterize the deposited thin films using spectroscopic ellipsometry, X-ray diffraction, Hall effect, J-V curves and electrochemical impedance spectroscopy. {\textcopyright}The Electrochemical Society.",

author = "Nicolas T{\'e}treault and L-P. Heiniger and M Stefik and Labouch{\`e}re, {P. L.} and {\'E}ric Arsenault and Nazeeruddin, {N. K.} and Ozin, {G A.} and M. Gr{\"a}tzel",

note = "KAUST Repository Item: Exported on 2020-10-01 Acknowledged KAUST grant number(s): KUS-C1-015-21 Acknowledgements: N. T. work was supported by the King Abdullah University of Science and Technology (KAUST, Award No KUS-C1-015-21). L-P. H. is supported by the Swiss National Science Foundation (Grant Nr. 200020_125163). P. L. and M.K.N work is funded by EU FP7 project “ORION” grant agreement number NMP-229036. G. A. O. is deeply indebted to the Government of Canada for a Research Chair in Materials Chemistry and Nanochemistry enabling this research at UofT. In addition he thanks the Natural Sciences and Engineering Research Council (NSERC) of Canada and the NSERC Solar Network for strong and sustained financial support of this work. E. A. thanks NSERC for a graduate scholarship. This publication acknowledges KAUST support, but has no KAUST affiliated authors.",

year = "2011",

doi = "10.1149/1.3633681",

language = "English (US)",

isbn = "9781566779029",

pages = "303--314",

booktitle = "ECS Transactions",

publisher = "The Electrochemical Society",

}

TY - GEN

T1 - (Invited) Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells

AU - Tétreault, Nicolas

AU - Heiniger, L-P.

AU - Stefik, M

AU - Labouchère, P. L.

AU - Arsenault, Éric

AU - Nazeeruddin, N. K.

AU - Ozin, G A.

AU - Grätzel, M.

N1 - KAUST Repository Item: Exported on 2020-10-01 Acknowledged KAUST grant number(s): KUS-C1-015-21 Acknowledgements: N. T. work was supported by the King Abdullah University of Science and Technology (KAUST, Award No KUS-C1-015-21). L-P. H. is supported by the Swiss National Science Foundation (Grant Nr. 200020_125163). P. L. and M.K.N work is funded by EU FP7 project “ORION” grant agreement number NMP-229036. G. A. O. is deeply indebted to the Government of Canada for a Research Chair in Materials Chemistry and Nanochemistry enabling this research at UofT. In addition he thanks the Natural Sciences and Engineering Research Council (NSERC) of Canada and the NSERC Solar Network for strong and sustained financial support of this work. E. A. thanks NSERC for a graduate scholarship. This publication acknowledges KAUST support, but has no KAUST affiliated authors.

PY - 2011

Y1 - 2011

N2 - Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al 2O 3, ZnO, SnO 2, Nb 2O 5, HfO 2, Ga 2O 3 and TiO 2 for research on dye-sensitized solar cell. In particular, we review the fabrication of state-of-the-art 3D host-passivation-guest photoanodes and ZnO nanowires as well as characterize the deposited thin films using spectroscopic ellipsometry, X-ray diffraction, Hall effect, J-V curves and electrochemical impedance spectroscopy. ©The Electrochemical Society.

AB - Herein we present the latest fabrication and characterization techniques for atomic layer deposition of Al 2O 3, ZnO, SnO 2, Nb 2O 5, HfO 2, Ga 2O 3 and TiO 2 for research on dye-sensitized solar cell. In particular, we review the fabrication of state-of-the-art 3D host-passivation-guest photoanodes and ZnO nanowires as well as characterize the deposited thin films using spectroscopic ellipsometry, X-ray diffraction, Hall effect, J-V curves and electrochemical impedance spectroscopy. ©The Electrochemical Society.

UR - http://hdl.handle.net/10754/597206

UR - https://iopscience.iop.org/article/10.1149/1.3633681

UR - http://www.scopus.com/inward/record.url?scp=84857299979&partnerID=8YFLogxK

U2 - 10.1149/1.3633681

DO - 10.1149/1.3633681

M3 - Conference contribution

SN - 9781566779029

SP - 303

EP - 314

BT - ECS Transactions

PB - The Electrochemical Society

ER -

(Invited) Atomic Layer Deposition for Novel Dye-Sensitized Solar Cells

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