Abstract
The aim of this study was to develop a viable technology to realize arbitrary shaped and sized patterns embedded in three-dimensional microstructures. In this paper, we present a new fabrication process based on a binary resist process scheme with the combined use of electron-beam lithography and multi-tilted x-ray lithography. We demonstrate the fabrication of three-dimensional photonic crystal structures with embedded waveguides and the fabrication of a flyover micro-fluidic channel.
Original language | English (US) |
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Pages (from-to) | 40-46 |
Number of pages | 7 |
Journal | Nanotechnology |
Volume | 16 |
Issue number | 1 |
DOIs | |
State | Published - Jan 2005 |
Externally published | Yes |
ASJC Scopus subject areas
- Bioengineering
- General Chemistry
- General Materials Science
- Mechanics of Materials
- Mechanical Engineering
- Electrical and Electronic Engineering