Integration of high-k gate stack systems into planar CMOS process flows

H. R. Huff, A. Agarwal, Youngjin Kim, L. Perrymore, D. Riley, J. Barnett, C. Sparks, M. Freiler, G. Gebara, B. Bowers, Peng Chen, P. Lysaght, B. Nguyen, S. Lim, G. Bersuker, P. Zeitzoff, Graham Brown, C. Young, B. Foran, F. ShaapurA. Hou, C. Lim, Husam Niman Alshareef, S. Borthakur, D. J. Derro, R. Bergmann, L. A. Larson, M. I. Gardner, J. Gutt, R. W. Murto, K. TorresShow 11 othersShow less