Integration of dual metal gate CMOS on high-k dielectrics utilizing a metal wet etch process

Zhibo Zhang*, S. C. Song, Craig Huffman, Muhammad M. Hussain, Joel Barnett, Naim Moumen, Husam N. Alshareef, Prashant Majhi, Johnny H. Sim, Sang Ho Bae, Byoung Hun Lee

*Corresponding author for this work

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