Integration of a poisoning-free dual damascene CDO film stack for 90 nm & beyond low-k BEOL

Wu Ping Liu*, Juan Boon Tan, Wei Lu, Shyam Pal, Yong Kong Siew, Hai Cong, Bei Chao Zhang, Xianbin Wang, Fan Zhang, Liang Choo Hsia

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

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    Engineering & Materials Science