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InGaAs/GaAs quantum-dot intermixing using arsenic and phosphorus ion implantation-induced disordering
H. S. Djie,
B. S. Ooi
*
, V. Aimez
*
Corresponding author for this work
Research output
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Contribution to journal
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Article
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peer-review
7
Scopus citations
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Dive into the research topics of 'InGaAs/GaAs quantum-dot intermixing using arsenic and phosphorus ion implantation-induced disordering'. Together they form a unique fingerprint.
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Physics
Annealing
100%
Arsenic
66%
Blue Shift
33%
Diffusivity
33%
Implantation
100%
Impurities
33%
Ion
66%
Ion Implantation
66%
Photonics
33%
Temperature
66%
Transients
33%
Material Science
Beryllium Ion
33%
Gallium Arsenide
66%
Impurity
33%
Indium Gallium Arsenide
66%