Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition

Yara Banda; Seong Ho Cho; Yanqing Jia; Si Young Bae; Tien Khee Ng; Boon S. Ooi

doi:10.1109/IPC57732.2023.10360725

Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition

Yara Banda^*, Seong Ho Cho, Yanqing Jia, Si Young Bae, Tien Khee Ng, Boon S. Ooi

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

We developed an inductively coupled plasma etching process for orthorhombic phase gallium oxide films through tuning of process parameters. We achieved a high etch rate of 130 nm/min while showing a surface roughness reduction of 56%. The optimized etching recipe produced a vertical sidewall profile.

Original language	English (US)
Title of host publication	2023 IEEE Photonics Conference, IPC 2023 - Proceedings
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9798350347227
DOIs	https://doi.org/10.1109/IPC57732.2023.10360725
State	Published - 2023
Event	2023 IEEE Photonics Conference, IPC 2023 - Orlando, United States Duration: Nov 12 2023 → Nov 16 2023

Publication series

Name	2023 IEEE Photonics Conference, IPC 2023 - Proceedings

Conference

Conference	2023 IEEE Photonics Conference, IPC 2023
Country/Territory	United States
City	Orlando
Period	11/12/23 → 11/16/23

Bibliographical note

Publisher Copyright:
© 2023 IEEE.

Keywords

inductively coupled plasma (ICP) etching
mist chemical vapor deposition (mist-CVD)
orthorhombic gallium oxide

ASJC Scopus subject areas

Artificial Intelligence
Computer Networks and Communications
Safety, Risk, Reliability and Quality
Control and Optimization
Atomic and Molecular Physics, and Optics

Access to Document

10.1109/IPC57732.2023.10360725

Cite this

Banda, Y., Cho, S. H., Jia, Y., Bae, S. Y., Ng, T. K., & Ooi, B. S. (2023). Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition. In 2023 IEEE Photonics Conference, IPC 2023 - Proceedings (2023 IEEE Photonics Conference, IPC 2023 - Proceedings). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IPC57732.2023.10360725

@inproceedings{cb2324aad39342efa7bdb60772fb83fd,

title = "Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition",

abstract = "We developed an inductively coupled plasma etching process for orthorhombic phase gallium oxide films through tuning of process parameters. We achieved a high etch rate of 130 nm/min while showing a surface roughness reduction of 56%. The optimized etching recipe produced a vertical sidewall profile.",

keywords = "inductively coupled plasma (ICP) etching, mist chemical vapor deposition (mist-CVD), orthorhombic gallium oxide",

author = "Yara Banda and Cho, {Seong Ho} and Yanqing Jia and Bae, {Si Young} and Ng, {Tien Khee} and Ooi, {Boon S.}",

note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 2023 IEEE Photonics Conference, IPC 2023 ; Conference date: 12-11-2023 Through 16-11-2023",

year = "2023",

doi = "10.1109/IPC57732.2023.10360725",

language = "English (US)",

series = "2023 IEEE Photonics Conference, IPC 2023 - Proceedings",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

booktitle = "2023 IEEE Photonics Conference, IPC 2023 - Proceedings",

address = "United States",

}

Banda, Y, Cho, SH, Jia, Y, Bae, SY, Ng, TK & Ooi, BS 2023, Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition. in 2023 IEEE Photonics Conference, IPC 2023 - Proceedings. 2023 IEEE Photonics Conference, IPC 2023 - Proceedings, Institute of Electrical and Electronics Engineers Inc., 2023 IEEE Photonics Conference, IPC 2023, Orlando, United States, 11/12/23. https://doi.org/10.1109/IPC57732.2023.10360725

Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition. / Banda, Yara; Cho, Seong Ho; Jia, Yanqing et al.
2023 IEEE Photonics Conference, IPC 2023 - Proceedings. Institute of Electrical and Electronics Engineers Inc., 2023. (2023 IEEE Photonics Conference, IPC 2023 - Proceedings).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition

AU - Banda, Yara

AU - Cho, Seong Ho

AU - Jia, Yanqing

AU - Bae, Si Young

AU - Ng, Tien Khee

AU - Ooi, Boon S.

PY - 2023

Y1 - 2023

N2 - We developed an inductively coupled plasma etching process for orthorhombic phase gallium oxide films through tuning of process parameters. We achieved a high etch rate of 130 nm/min while showing a surface roughness reduction of 56%. The optimized etching recipe produced a vertical sidewall profile.

AB - We developed an inductively coupled plasma etching process for orthorhombic phase gallium oxide films through tuning of process parameters. We achieved a high etch rate of 130 nm/min while showing a surface roughness reduction of 56%. The optimized etching recipe produced a vertical sidewall profile.

KW - inductively coupled plasma (ICP) etching

KW - mist chemical vapor deposition (mist-CVD)

KW - orthorhombic gallium oxide

UR - http://www.scopus.com/inward/record.url?scp=85182561836&partnerID=8YFLogxK

U2 - 10.1109/IPC57732.2023.10360725

DO - 10.1109/IPC57732.2023.10360725

M3 - Conference contribution

AN - SCOPUS:85182561836

T3 - 2023 IEEE Photonics Conference, IPC 2023 - Proceedings

BT - 2023 IEEE Photonics Conference, IPC 2023 - Proceedings

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2023 IEEE Photonics Conference, IPC 2023

Y2 - 12 November 2023 through 16 November 2023

ER -

Banda Y, Cho SH, Jia Y, Bae SY, Ng TK , Ooi BS. Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition. In 2023 IEEE Photonics Conference, IPC 2023 - Proceedings. Institute of Electrical and Electronics Engineers Inc. 2023. (2023 IEEE Photonics Conference, IPC 2023 - Proceedings). doi: 10.1109/IPC57732.2023.10360725

Inductively coupled plasma etching of orthorhombic gallium oxide films grown by mist chemical vapor deposition

Abstract

Publication series

Conference

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this