Indium-Free Fully Transparent Electronics Deposited Entirely by Atomic Layer Deposition

Pradipta K. Nayak, Zhenwei Wang, Husam N. Alshareef

Research output: Contribution to journalArticlepeer-review

41 Scopus citations


Indium-free, fully transparent thin-film transistors are fabricated entirely by the atomic layer deposition technique on rigid and flexible substrates at a low temperature of 160 °C. The transistors show high saturation mobility, large switching ratio, and small subthreshold swing value. The inverters and ring oscillators show large gain value and small propagation delay time, indicating the potential of this process in transparent electronic devices.
Original languageEnglish (US)
Pages (from-to)7736-7744
Number of pages9
JournalAdvanced Materials
Issue number35
StatePublished - Jul 4 2016

Bibliographical note

KAUST Repository Item: Exported on 2020-10-01
Acknowledgements: P.K.N. and Z.W. contributed equally to this work. H.N.A. and Z.W. thank Prof. Khaled Salama for several technical discussions specifically on ring oscillator design and measurement, and for developing the device models for our TFT process, which correctly predicted experimental ring oscillator results. Dr. Mrinal K. Hota, core laboratory staff, imaging and characterization staff of KAUST are also thanked for their useful help in the study. Research reported in this publication was supported by King Abdullah University of Science and Technology (KAUST) under the Sensors Initiative.


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