Abstract
Incorporation of N into GaAsN under N overpressure and underpressure conditions was investigated. Molecular beam epitaxy equipped with a radio frequency nitrogen plasma source was used to grow GaAsN. Results showed that for the GaAsN grown at lower growth rate, the N concentration was influenced by the arsenic pressure.
Original language | English (US) |
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Pages (from-to) | 1069-1073 |
Number of pages | 5 |
Journal | Journal of Applied Physics |
Volume | 94 |
Issue number | 2 |
DOIs | |
State | Published - Jul 15 2003 |
Externally published | Yes |
ASJC Scopus subject areas
- General Physics and Astronomy