In situ X-ray diffraction monitoring of GaInN/GaN superlattice during organometalic vapor phase epitaxy growth

Taiji Yamamoto, Daisuke Iida, Yasunari Kondo, Mihoko Sowa, Shinya Umeda, Motoaki Iwaya, Tetsuya Takeuchi, Satoshi Kamiyama, Isamu Akasaki

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

We observed the growth of the Ga0.80In0.20N (2 nm)/GaN (3 nm) superlattice (SL) structure by in situ X-ray diffraction (XRD) monitoring. The satellite peaks from the -1st to the +1st order can be obtained from these in situ XRD spectrums. From the full width at half maximums (FWHMs) of the 0th and -1st satellite peaks as a function of the SL periods, we observed a clear trend in each FWHM. It was found that by analyzing this trend along with florescence microscopic and transmission electron microscopic analysis, an analysis of the In segregation and misfit dislocation are possible. Accordingly, if we employ in situ XRD under various growth conditions, the optimization of the growth conditions will become easier because it would be possible to determine the number of periods at which In segregation and misfit dislocation increases by only one growth procedure. © 2013 Elsevier B.V.
Original languageEnglish (US)
Pages (from-to)108-113
Number of pages6
JournalJournal of Crystal Growth
Volume393
DOIs
StatePublished - May 1 2014
Externally publishedYes

Bibliographical note

Generated from Scopus record by KAUST IRTS on 2023-09-21

ASJC Scopus subject areas

  • Materials Chemistry
  • Inorganic Chemistry
  • Condensed Matter Physics

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