In situ growth monitoring of nanocomposite TiN/SiN1.3 and TiCxNy/SiCN films using spectroscopic ellipsometry

P. Jedrzejowski; A. Amassian; E. Bousser; L. Martinu; J. E. Klemberg-Sapieha

In situ growth monitoring of nanocomposite TiN/SiN_1.3 and TiC_xN_y/SiCN films using spectroscopic ellipsometry

P. Jedrzejowski^*, A. Amassian, E. Bousser, L. Martinu, J. E. Klemberg-Sapieha

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

Abstract

Spectroscopic ellipsometry has been used to investigate the electronic properties and the growth of TiN-based hard and super hard nanocomposite (nc) coatings, namely TiN, nc-TiN/SiN_1.3 and nc-TiC_xN/SiCN. These materials, characterized by a hardness of 45-55 GPa, were synthesized by plasma enhanced chemical vapor deposition (PECVD) from TiCl₄/ CH ₄/SiH₄/N₂ gas mixtures at a temperature of 500°C. The film optical properties were modeled using mixed Drude (intraband) and Lorentz (interband) electronic absorptions. This allowed us to evaluate, in real-time, the evolution of the electrical properties, while finding an excellent agreement with direct four-point measurements and the microstructural characteristics.

Original language	English (US)
Pages (from-to)	68-73
Number of pages	6
Journal	Proceedings, Annual Technical Conference - Society of Vacuum Coaters
State	Published - 2005
Externally published	Yes
Event	SVC, Society of Vacuum Coaters - 48th Annual Technical Conference - Denver, CO, United States Duration: Apr 23 2005 → Apr 28 2005

Keywords

Electrical and optical properties
Nanocomposites
Spectroscopic ellipsometry
Super hard films

ASJC Scopus subject areas

Mechanical Engineering
Surfaces and Interfaces
Fluid Flow and Transfer Processes
Surfaces, Coatings and Films

Cite this

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title = "In situ growth monitoring of nanocomposite TiN/SiN1.3 and TiCxNy/SiCN films using spectroscopic ellipsometry",

abstract = "Spectroscopic ellipsometry has been used to investigate the electronic properties and the growth of TiN-based hard and super hard nanocomposite (nc) coatings, namely TiN, nc-TiN/SiN1.3 and nc-TiCxN/SiCN. These materials, characterized by a hardness of 45-55 GPa, were synthesized by plasma enhanced chemical vapor deposition (PECVD) from TiCl4/ CH 4/SiH4/N2 gas mixtures at a temperature of 500°C. The film optical properties were modeled using mixed Drude (intraband) and Lorentz (interband) electronic absorptions. This allowed us to evaluate, in real-time, the evolution of the electrical properties, while finding an excellent agreement with direct four-point measurements and the microstructural characteristics.",

keywords = "Electrical and optical properties, Nanocomposites, Spectroscopic ellipsometry, Super hard films",

author = "P. Jedrzejowski and A. Amassian and E. Bousser and L. Martinu and Klemberg-Sapieha, {J. E.}",

year = "2005",

language = "English (US)",

pages = "68--73",

journal = "Proceedings, Annual Technical Conference - Society of Vacuum Coaters",

issn = "0737-5921",

publisher = "Society of Plastics Engineers",

note = "SVC, Society of Vacuum Coaters - 48th Annual Technical Conference ; Conference date: 23-04-2005 Through 28-04-2005",

}

TY - JOUR

T1 - In situ growth monitoring of nanocomposite TiN/SiN1.3 and TiCxNy/SiCN films using spectroscopic ellipsometry

AU - Jedrzejowski, P.

AU - Amassian, A.

AU - Bousser, E.

AU - Martinu, L.

AU - Klemberg-Sapieha, J. E.

PY - 2005

Y1 - 2005

N2 - Spectroscopic ellipsometry has been used to investigate the electronic properties and the growth of TiN-based hard and super hard nanocomposite (nc) coatings, namely TiN, nc-TiN/SiN1.3 and nc-TiCxN/SiCN. These materials, characterized by a hardness of 45-55 GPa, were synthesized by plasma enhanced chemical vapor deposition (PECVD) from TiCl4/ CH 4/SiH4/N2 gas mixtures at a temperature of 500°C. The film optical properties were modeled using mixed Drude (intraband) and Lorentz (interband) electronic absorptions. This allowed us to evaluate, in real-time, the evolution of the electrical properties, while finding an excellent agreement with direct four-point measurements and the microstructural characteristics.

AB - Spectroscopic ellipsometry has been used to investigate the electronic properties and the growth of TiN-based hard and super hard nanocomposite (nc) coatings, namely TiN, nc-TiN/SiN1.3 and nc-TiCxN/SiCN. These materials, characterized by a hardness of 45-55 GPa, were synthesized by plasma enhanced chemical vapor deposition (PECVD) from TiCl4/ CH 4/SiH4/N2 gas mixtures at a temperature of 500°C. The film optical properties were modeled using mixed Drude (intraband) and Lorentz (interband) electronic absorptions. This allowed us to evaluate, in real-time, the evolution of the electrical properties, while finding an excellent agreement with direct four-point measurements and the microstructural characteristics.

KW - Electrical and optical properties

KW - Nanocomposites

KW - Spectroscopic ellipsometry

KW - Super hard films

UR - http://www.scopus.com/inward/record.url?scp=33645010841&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:33645010841

SN - 0737-5921

SP - 68

EP - 73

JO - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

JF - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

T2 - SVC, Society of Vacuum Coaters - 48th Annual Technical Conference

Y2 - 23 April 2005 through 28 April 2005

ER -

In situ growth monitoring of nanocomposite TiN/SiN_1.3 and TiC_xN_y/SiCN films using spectroscopic ellipsometry

Abstract

Keywords

ASJC Scopus subject areas

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