Improved catalytic activity and stability of mesostructured sulfated zirconia by Al promoter

Yinyong Sun, Lina Yuan, Shengqian Ma, Yu Han, Lan Zhao, Wei Wang, Chang Lin Chen, Feng Shou Xiao*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

41 Scopus citations

Abstract

Al-promoted mesostructured sulfated zirconia (Al-MSZ-5) has been successfully synthesized from the template of triblock polymer surfactant (P123) in aqueous solution. Mesostructured Al-MSZ-5 shows high thermal stability, and it can preserve its characteristic mesostructures until calcination at 650°C. In contrast, the mesostructure of mesoporous sulfated zirconia (MSZ-5) will be destroyed during calcination at 600°C. Catalytic data for n-butane isomerization show that the Al-MSZ-5 exhibits higher catalytic activity and better stability than both MSZ-5 and conventional Al-promoted sulfated zirconia (Al-SZ). The Al-MSZ-5 sample was characterized by XRD, bright-field and dark-field TEM images, N2 adsorption isotherms, NMR, TG-DTA, IR, and numerous other techniques. The results suggest that Al-MSZ-5 has worm-like mesopores, and that the mesostructured walls contain tetragonal crystalline ZrO2. Such unique structural features might be responsible for the observed large surface area, high catalytic activity for n-butane isomerization, and high thermal stability of mesostructured Al-MSZ-5.

Original languageEnglish (US)
Pages (from-to)17-24
Number of pages8
JournalApplied Catalysis A: General
Volume268
Issue number1-2
DOIs
StatePublished - Aug 10 2004
Externally publishedYes

Bibliographical note

Funding Information:
This work was supported by National Natural Science Foundation of China (20173022, 20121103, and 20233030), State Basic Research Project of China (G2000077507), and National Advanced Materials Committee of China (2002AA321010).

Keywords

  • Al-promoted
  • Mesostructured
  • Non-ion surfactant
  • Sulfated zirconia
  • n-Butane isomerization

ASJC Scopus subject areas

  • Catalysis
  • Process Chemistry and Technology

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