Impact of carbon incorporation on the effective work function of WN and TaN metal gate electrodes

H. N. Alshareef; M. Quevedo-Lopez; H. C. Wen; C. Huffman; M. El-Bouanani; B. E. Gnade

doi:10.1149/1.2908579

Impact of carbon incorporation on the effective work function of WN and TaN metal gate electrodes

H. N. Alshareef, M. Quevedo-Lopez, H. C. Wen, C. Huffman, M. El-Bouanani, B. E. Gnade

Research output: Contribution to journal › Article › peer-review

6 Scopus citations

Abstract

Plasma carbonization was used to study the effect of carbon incorporation on the work function of metal nitride gates. The work functions were shifted by as much as 200 mV upon the incorporation of 8% carbon. X-ray photoelectron spectroscopy shows that these shifts in the work function values are mainly driven by the formation of metal-carbon and carbon-carbon bonds in the metal gate. In particular, the work function decreased with increasing the metal-carbon bond concentration, reaching as low as 4.28 eV for TaC with 50% carbon. This correlation of bonding with the work function can be used to tune the work function of metal gates.

Original language	English (US)
Pages (from-to)	H182-H184
Journal	Electrochemical and Solid-State Letters
Volume	11
Issue number	7
DOIs	https://doi.org/10.1149/1.2908579
State	Published - 2008
Externally published	Yes

ASJC Scopus subject areas

General Chemical Engineering
Electrical and Electronic Engineering
General Materials Science
Electrochemistry
Physical and Theoretical Chemistry

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abstract = "Plasma carbonization was used to study the effect of carbon incorporation on the work function of metal nitride gates. The work functions were shifted by as much as 200 mV upon the incorporation of 8% carbon. X-ray photoelectron spectroscopy shows that these shifts in the work function values are mainly driven by the formation of metal-carbon and carbon-carbon bonds in the metal gate. In particular, the work function decreased with increasing the metal-carbon bond concentration, reaching as low as 4.28 eV for TaC with 50% carbon. This correlation of bonding with the work function can be used to tune the work function of metal gates.",

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T1 - Impact of carbon incorporation on the effective work function of WN and TaN metal gate electrodes

AU - Alshareef, H. N.

AU - Quevedo-Lopez, M.

AU - Wen, H. C.

AU - Huffman, C.

AU - El-Bouanani, M.

AU - Gnade, B. E.

PY - 2008

Y1 - 2008

N2 - Plasma carbonization was used to study the effect of carbon incorporation on the work function of metal nitride gates. The work functions were shifted by as much as 200 mV upon the incorporation of 8% carbon. X-ray photoelectron spectroscopy shows that these shifts in the work function values are mainly driven by the formation of metal-carbon and carbon-carbon bonds in the metal gate. In particular, the work function decreased with increasing the metal-carbon bond concentration, reaching as low as 4.28 eV for TaC with 50% carbon. This correlation of bonding with the work function can be used to tune the work function of metal gates.

AB - Plasma carbonization was used to study the effect of carbon incorporation on the work function of metal nitride gates. The work functions were shifted by as much as 200 mV upon the incorporation of 8% carbon. X-ray photoelectron spectroscopy shows that these shifts in the work function values are mainly driven by the formation of metal-carbon and carbon-carbon bonds in the metal gate. In particular, the work function decreased with increasing the metal-carbon bond concentration, reaching as low as 4.28 eV for TaC with 50% carbon. This correlation of bonding with the work function can be used to tune the work function of metal gates.

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JO - Electrochemical and Solid-State Letters

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ER -

Impact of carbon incorporation on the effective work function of WN and TaN metal gate electrodes

Abstract

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