Highly tunable NEMS shallow arches

Syed N.R. Kazmi, Amal Z. Hajjaj, Pedro M.F.J. Costa, Mohammad I. Younis

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


We report highly tunable nanoelectromechanical systems NEMS shallow arches under dc excitation voltages. Silicon based in-plane doubly clamped bridges, slightly curved as shallow arches, are fabricated using standard electron beam lithography and surface nanomachining of a highly conductive device layer on a silicon-on-insulator wafer. By designing the structures to have gap to thickness ratio of more than four, the mid-plane stretching of the nano arches is maximized such that an increase in the dc bias voltage will result into continuous increase in the resonance frequency of the resonators to wide ranges. This is confirmed analytically based on a nonlinear beam model. The experimental results are found to be in good agreement with that of the results from developed analytical model. A maximum tunability of 108.14% for a 180 nm thick arch with an initially designed gap of 1 μm between the beam and the driving/sensing electrodes is achieved. Furthermore, a tunable narrow bandpass filter is demonstrated, which opens up opportunities for designing such structures as filtering elements in high frequency ranges.

Original languageEnglish (US)
Title of host publication2017 IEEE 17th International Conference on Nanotechnology, NANO 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages6
ISBN (Electronic)9781509030286
StatePublished - Nov 21 2017
Event17th IEEE International Conference on Nanotechnology, NANO 2017 - Pittsburgh, United States
Duration: Jul 25 2017Jul 28 2017

Publication series

Name2017 IEEE 17th International Conference on Nanotechnology, NANO 2017


Conference17th IEEE International Conference on Nanotechnology, NANO 2017
Country/TerritoryUnited States

Bibliographical note

Publisher Copyright:
© 2017 IEEE.

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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