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Hafnium-based thin oxides: Versatile insulators for microelectronics
Albin Bayerl, Mario Lanza
Research output
:
Chapter in Book/Report/Conference proceeding
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Chapter
1
Scopus citations
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Keyphrases
Oxides
100%
Microelectronics
100%
Resistive Switching
100%
Insulator
100%
Thin Oxide Films
100%
Hafnium
100%
Transistor
50%
Electrical Performance
50%
Memory Cells
50%
Fabrication Technology
50%
Unique Properties
50%
HfO2
50%
Conductive Filament
50%
Memory Technology
50%
Grain Boundary
50%
Resistive Random Access Memory (ReRAM)
50%
Leakage Current
50%
Random Access Memory
50%
Low Resistance State
50%
Resistivity Change
50%
Defect Accumulation
50%
High Resistive State
50%
High Lateral Resolution
50%
Material Science
Hafnium
100%
Microelectronics
100%
Oxide Compound
100%
Resistive Random-Access Memory
33%
Electrical Resistivity
33%
Transistor
33%
Grain Boundary
33%