Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure

Xiaochen Dong, Peng Wang, Wenjing Fang, Ching Yuan Su, Yu Hsin Chen, Lain Jong Li, Wei Huang, Peng Chen*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

151 Scopus citations

Abstract

Large-sized thin-films composed of single- and few-layered graphene have been synthesized by chemical vapor deposition (CVD) on copper foils under atmospheric pressure using ethanol or pentane as the precursor. Confocal Raman measurements, transmission electron microscopy and scanning tunneling microscopy show that the majority part of the obtained films exhibit hexagonal graphene lattice. Optical microscopy and electrical measurements confirm the continuity of these films. It is also found that the CVD-grown graphene films with ethanol as the precursor exhibit lower defect density, higher electrical conductivity, and higher hall mobility than those grown with pentane as the precursor. This liquid-precursor-based atmospheric pressure CVD synthesis provides a new route for simple, inexpensive and safe growth of graphene thin-films.

Original languageEnglish (US)
Pages (from-to)3672-3678
Number of pages7
JournalCarbon
Volume49
Issue number11
DOIs
StatePublished - Sep 2011

Bibliographical note

Funding Information:
We acknowledge the financial support from the NNSF of China ( 50902071 , 61076067 , 61006007 ), the 973 Program (China, 2009CB930601 ), the Science Foundation of Nanjing University of Posts and Telecommunications ( NY208058 ), the National Science Foundation for Post-doctoral Scientists of China ( 20100471354 ) National Science Foundation of Jiangsu Province ( BK2010525 ), the Research Center for Applied Science (Academia Sinica, Taiwan), A-Star SERC Grant (No. 0721010020 , Singapore) and National Research Foundation Singapore ( NRF-CRP 2-2007-02 ).

ASJC Scopus subject areas

  • General Chemistry
  • General Materials Science

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