Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique

G. C. Han; Y. H. Wu; M. Tay; Z. B. Guo; K. B. Li; C. T. Chong

doi:10.1016/j.jmmm.2003.12.799

Growth and magnetic properties of TiO₂: Co anatase thin films by sputtering technique

G. C. Han^*, Y. H. Wu, M. Tay, Z. B. Guo, K. B. Li, C. T. Chong

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

TiO₂:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO₃ substrates by sputtering techniques. A wide range of saturation moment (m_s) up to 1.51 μ_B/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher m_s value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample.

Original language	English (US)
Pages (from-to)	e1537-e1538
Journal	Journal of Magnetism and Magnetic Materials
Volume	272-276
Issue number	SUPPL. 1
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.799
State	Published - May 2004
Externally published	Yes

Keywords

Magnetic semiconductor
Sputtering
Thin film
TiO: Co

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Access to Document

10.1016/j.jmmm.2003.12.799

Cite this

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title = "Growth and magnetic properties of TiO2: Co anatase thin films by sputtering technique",

abstract = "TiO2:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO3 substrates by sputtering techniques. A wide range of saturation moment (ms) up to 1.51 μB/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher ms value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample.",

keywords = "Magnetic semiconductor, Sputtering, Thin film, TiO: Co",

author = "Han, {G. C.} and Wu, {Y. H.} and M. Tay and Guo, {Z. B.} and Li, {K. B.} and Chong, {C. T.}",

year = "2004",

month = may,

doi = "10.1016/j.jmmm.2003.12.799",

language = "English (US)",

volume = "272-276",

pages = "e1537--e1538",

journal = "Journal of Magnetism and Magnetic Materials",

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TY - JOUR

T1 - Growth and magnetic properties of TiO2

T2 - Co anatase thin films by sputtering technique

AU - Han, G. C.

AU - Wu, Y. H.

AU - Tay, M.

AU - Guo, Z. B.

AU - Li, K. B.

AU - Chong, C. T.

PY - 2004/5

Y1 - 2004/5

N2 - TiO2:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO3 substrates by sputtering techniques. A wide range of saturation moment (ms) up to 1.51 μB/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher ms value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample.

AB - TiO2:Co thin films were epitaxially grown in the form of single layer and digital alloy on LaAlO3 substrates by sputtering techniques. A wide range of saturation moment (ms) up to 1.51 μB/Co were obtained, depending on both Co content and deposition parameters. Surface morphology of the films seems to suggest the existence of Co clustering. However, higher ms value is not obtained from the films with the larger and denser clustering, implying that both charge carriers and Co clustering are contributing to the overall magnetism of the sample.

KW - Magnetic semiconductor

KW - Sputtering

KW - Thin film

KW - TiO: Co

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DO - 10.1016/j.jmmm.2003.12.799

M3 - Article

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SN - 0304-8853

VL - 272-276

SP - e1537-e1538

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

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