An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 104 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.
|Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
|Published - Nov 2011
Bibliographical noteFunding Information:
This work was supported in part by the National Science Council, Taiwan, under Grant Nos. NSC 100-2628-E-001-001 and NSC 99-2112-M-001-021-MY3.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Process Chemistry and Technology
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering
- Materials Chemistry