Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

Meng Yu Lin*, Yung Shuan Sheng, Shu Han Chen, Ching Yuan Su, Lain Jong Li, Shih Yen Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

An alternate approach to the preparation of transfer-free graphitic carbon films is proposed in this paper. Using a standard radio-frequency sputtering system and a high-temperature annealing procedure, graphitic carbon films are prepared under Ni templates. The results demonstrate that carbon precipitation occurs at both Ni template interfaces. With repeated annealing procedures at 1100 °C, a sheet resistance of 1.36 × 104 Ω/□ can be achieved. Selective carbon film deposition has also been developed via pattern formation on the Ni templates. The results indicate the potential application of this method to transparent electrode formation.

Original languageEnglish (US)
Article number061202
JournalJournal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Volume29
Issue number6
DOIs
StatePublished - Nov 2011
Externally publishedYes

Bibliographical note

Funding Information:
This work was supported in part by the National Science Council, Taiwan, under Grant Nos. NSC 100-2628-E-001-001 and NSC 99-2112-M-001-021-MY3.

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Process Chemistry and Technology
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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