Fingerprint
Dive into the research topics of 'Gate oxide wear out using novel polysilazane-base inorganic as nano-scaling shallow trench filling'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Gate oxide wear out using novel polysilazane-base inorganic as nano-scaling shallow trench filling
Ching Yuan Ho*, Kai Yao Shih, Jr-Hau He
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
1
Scopus
citations