Formation and structure of epitaxial fe-films by targets-facing type of sputtering

En Yong Jiang; Xi Xiang Zhang; Jin E. Li; Yu Guang Liu

doi:10.1109/TMAG.1987.1065288

Formation and structure of epitaxial fe-films by targets-facing type of sputtering

En Yong Jiang, Xi Xiang Zhang, Jin E. Li, Yu Guang Liu

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

The epitaxial monocrystal Fe-films have first been prepared on the NaCl (100) substrate by means of targets-facing type of sputtering method. A series of electron diffraction patterns of the films are obtained by tilting around the b* axis. Electron diffraction structure analysis shows that the structure of the films corresponds to a tetragonal lattice with parameters a=b=5.86A and c=7.30A, containing four Fe-atoms, and its space group being l42d. The epitaxial growth process and the structures of the films depend strongly on substrate temperature (Ts), the thickness of the films (d), and the deposit rate (R).

Original language	English (US)
Pages (from-to)	2139-2140
Number of pages	2
Journal	IEEE Transactions on Magnetics
Volume	23
Issue number	5
DOIs	https://doi.org/10.1109/TMAG.1987.1065288
State	Published - Sep 1987
Externally published	Yes

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

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abstract = "The epitaxial monocrystal Fe-films have first been prepared on the NaCl (100) substrate by means of targets-facing type of sputtering method. A series of electron diffraction patterns of the films are obtained by tilting around the b* axis. Electron diffraction structure analysis shows that the structure of the films corresponds to a tetragonal lattice with parameters a=b=5.86A and c=7.30A, containing four Fe-atoms, and its space group being l42d. The epitaxial growth process and the structures of the films depend strongly on substrate temperature (Ts), the thickness of the films (d), and the deposit rate (R).",

author = "Jiang, {En Yong} and Zhang, {Xi Xiang} and Li, {Jin E.} and Liu, {Yu Guang}",

year = "1987",

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doi = "10.1109/TMAG.1987.1065288",

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journal = "IEEE Transactions on Magnetics",

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T1 - Formation and structure of epitaxial fe-films by targets-facing type of sputtering

AU - Jiang, En Yong

AU - Zhang, Xi Xiang

AU - Li, Jin E.

AU - Liu, Yu Guang

PY - 1987/9

Y1 - 1987/9

N2 - The epitaxial monocrystal Fe-films have first been prepared on the NaCl (100) substrate by means of targets-facing type of sputtering method. A series of electron diffraction patterns of the films are obtained by tilting around the b* axis. Electron diffraction structure analysis shows that the structure of the films corresponds to a tetragonal lattice with parameters a=b=5.86A and c=7.30A, containing four Fe-atoms, and its space group being l42d. The epitaxial growth process and the structures of the films depend strongly on substrate temperature (Ts), the thickness of the films (d), and the deposit rate (R).

AB - The epitaxial monocrystal Fe-films have first been prepared on the NaCl (100) substrate by means of targets-facing type of sputtering method. A series of electron diffraction patterns of the films are obtained by tilting around the b* axis. Electron diffraction structure analysis shows that the structure of the films corresponds to a tetragonal lattice with parameters a=b=5.86A and c=7.30A, containing four Fe-atoms, and its space group being l42d. The epitaxial growth process and the structures of the films depend strongly on substrate temperature (Ts), the thickness of the films (d), and the deposit rate (R).

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DO - 10.1109/TMAG.1987.1065288

M3 - Article

AN - SCOPUS:0023417103

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JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

IS - 5

ER -

Formation and structure of epitaxial fe-films by targets-facing type of sputtering

Abstract

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