Fluorocarbon resist for high-speed scanning probe lithography

Marco Rolandi*, Itai Suez, Andreas Scholl, Jean M.J. Fréchet

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

23 Scopus citations


(Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry.

Original languageEnglish (US)
Pages (from-to)7477-7480
Number of pages4
JournalAngewandte Chemie - International Edition
Issue number39
StatePublished - 2007
Externally publishedYes

Bibliographical note

Funding Information:
This work was conducted under the Midwest Geological Sequestration Consortium which is funded by the U.S. Department of Energy through the National Energy Technology Laboratory (NETL) via the Regional Carbon Sequestration Partnership Program (contract number DE-FC26-05NT42588) and by a cost share agreement with the Illinois Department of Commerce and Economic Opportunity, Office of Coal Development through the Illinois Clean Coal Institute.


  • Electron microscopy
  • Mass spectrometry
  • Nanostructures
  • Scanning probe lithography
  • Surface chemistry

ASJC Scopus subject areas

  • General Chemistry
  • Catalysis


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