Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

Zachary M. Fresco; Nicolas Bensel; Itai Suez; Scott A. Backer; Jean M.J. Fréchet; Will Conley

doi:10.2494/photopolymer.16.27

Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

Zachary M. Fresco^*, Nicolas Bensel, Itai Suez, Scott A. Backer, Jean M.J. Fréchet, Will Conley

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.

Original language	English (US)
Pages (from-to)	27-35
Number of pages	9
Journal	Journal of Photopolymer Science and Technology
Volume	16
Issue number	1
DOIs	https://doi.org/10.2494/photopolymer.16.27
State	Published - 2003
Externally published	Yes

Keywords

157 nm
Dissolution inhibitor
Hexafluoroalcohol
QCM

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

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10.2494/photopolymer.16.27

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title = "Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography",

abstract = "We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.",

keywords = "157 nm, Dissolution inhibitor, Hexafluoroalcohol, QCM",

author = "Fresco, {Zachary M.} and Nicolas Bensel and Itai Suez and Backer, {Scott A.} and Fr{\'e}chet, {Jean M.J.} and Will Conley",

year = "2003",

doi = "10.2494/photopolymer.16.27",

language = "English (US)",

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pages = "27--35",

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AU - Fresco, Zachary M.

AU - Bensel, Nicolas

AU - Suez, Itai

AU - Backer, Scott A.

AU - Fréchet, Jean M.J.

AU - Conley, Will

PY - 2003

Y1 - 2003

N2 - We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.

AB - We present the synthesis and screening of a series of new fluorinated materials designed to act as chemically amplified dissolution inhibitors for 157 nm lithography. Dissolution rates measured using a quartz crystal microbalance apparatus on a variety of matrix polymers as well as initial results demonstrating the imageability of this multi-component system are described.

KW - 157 nm

KW - Dissolution inhibitor

KW - Hexafluoroalcohol

KW - QCM

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U2 - 10.2494/photopolymer.16.27

DO - 10.2494/photopolymer.16.27

M3 - Article

AN - SCOPUS:0038168175

SN - 0914-9244

VL - 16

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EP - 35

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 1

ER -

Fluorinated chemically amplified dissolution inhibitors for 157 nm nanolithography

Abstract

Keywords

ASJC Scopus subject areas

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