Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Qiaoqiang Gan, Alexander Cartwright

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.
Original languageEnglish (US)
Title of host publicationConference on Lasers and Electro-Optics Europe - Technical Digest
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Print)9781557529688
StatePublished - Aug 10 2015
Externally publishedYes

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