Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji; Borui Chen; Xie Zeng; Tania Moein; Haomin Song; Qiaoqiang Gan; Alexander Cartwright

Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Dengxin Ji, Borui Chen, Xie Zeng, Tania Moein, Haomin Song, Qiaoqiang Gan, Alexander Cartwright

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

Original language	English (US)
Title of host publication	Conference on Lasers and Electro-Optics Europe - Technical Digest
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Print)	9781557529688
State	Published - Aug 10 2015
Externally published	Yes

Bibliographical note

Generated from Scopus record by KAUST IRTS on 2022-09-13

Cite this

@inproceedings{50a23582dd6f49439d1e46575f3b21c8,

title = "Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography",

abstract = "We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.",

author = "Dengxin Ji and Borui Chen and Xie Zeng and Tania Moein and Haomin Song and Qiaoqiang Gan and Alexander Cartwright",

note = "Generated from Scopus record by KAUST IRTS on 2022-09-13",

year = "2015",

month = aug,

day = "10",

language = "English (US)",

isbn = "9781557529688",

booktitle = "Conference on Lasers and Electro-Optics Europe - Technical Digest",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

address = "United States",

}

TY - GEN

T1 - Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

AU - Ji, Dengxin

AU - Chen, Borui

AU - Zeng, Xie

AU - Moein, Tania

AU - Song, Haomin

AU - Gan, Qiaoqiang

AU - Cartwright, Alexander

N1 - Generated from Scopus record by KAUST IRTS on 2022-09-13

PY - 2015/8/10

Y1 - 2015/8/10

N2 - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

AB - We developed a novel atomic layer lithography procedure to fabricate large area flat metallic surfaces with sub-10-nm features, which is particularly useful for fabrication of nanostructures with strongly localized field enhancement.

UR - http://www.scopus.com/inward/record.url?scp=84954052563&partnerID=8YFLogxK

M3 - Conference contribution

SN - 9781557529688

BT - Conference on Lasers and Electro-Optics Europe - Technical Digest

PB - Institute of Electrical and Electronics Engineers Inc.

ER -

Flat metallic surface with sub-10-nm gaps using modified atomic-layer lithography

Abstract

Bibliographical note

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